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Více o knize
Focusing on the physics and materials science, this book delves into ion implantation and ion beam modification, crucial for silicon integrated circuit technology. It discusses the intricacies of ion-solid interactions, predicting ion ranges, and addressing lattice disorder. The text covers essential processes like shallow-junction formation and the innovative use of hydrogen ion beams for silicon slicing. Additionally, it explores topics such as ion-beam mixing, stresses, and sputtering, highlighting their significance in enhancing materials properties and performance.
Nákup knihy
Ion Implantation and Synthesis of Materials, James W. Mayer, Michael Nastasi
- Jazyk
- Rok vydání
- 2010
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Doručení
Platební metody
Navrhnout úpravu
- Titul
- Ion Implantation and Synthesis of Materials
- Jazyk
- anglicky
- Autoři
- James W. Mayer, Michael Nastasi
- Vydavatel
- Springer Berlin Heidelberg
- Rok vydání
- 2010
- Vazba
- měkká
- Počet stran
- 280
- ISBN13
- 9783642062599
- Kategorie
- Příroda všeobecně
- Anotace
- Focusing on the physics and materials science, this book delves into ion implantation and ion beam modification, crucial for silicon integrated circuit technology. It discusses the intricacies of ion-solid interactions, predicting ion ranges, and addressing lattice disorder. The text covers essential processes like shallow-junction formation and the innovative use of hydrogen ion beams for silicon slicing. Additionally, it explores topics such as ion-beam mixing, stresses, and sputtering, highlighting their significance in enhancing materials properties and performance.